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About This Role
- Key Responsibilities: • Photomask and Reticle Operations: Oversee photomask incoming quality control, pellicle integrity, reticle qualification protocols, and reticle lifecycle management across advanced EUV and DUV toolsets. • Advanced Pellicle Development: Drive next gen EUV pellicle development, material optimization for enhanced transmission, stability, defect mitigation and overall yield improvement.
- Optimize reticle usage, inspection and disposition strategies over life cycle. • Cross-Functional Process Integration: Partner closely with Scanner/Litho teams, Reticle Design, Thin Films, Etch, and Yield Enhancement engineering teams to diagnose patterning excursions and accelerate technology transitions. • Yield Ramp and Excursion Containment: Lead root cause failure analysis (RCFA) for yield-limiting lithography and reticle-related defects during new process node development and high-volume manufacturing (HVM). • Technical Mentorship and Industry Engagement: Provide technical leadership to junior and mid-level process engineers, establish standard operating procedures (SOPs), and collaborate directly with leading lithography and mask equipment suppliers.
Qualifications
- Education: M.S. with 8+ years of foundry experience or Ph.D. of Foundry experience in Electrical Engineering, Chemical Engineering, Materials Science, Physics, Optics, Microelectronics, or a related semiconductor engineering discipline. • Experience: 8+ years of hands-on process engineering experience in advanced semiconductor lithography and photomask/reticle technologies within high-volume manufacturing (HVM) or advanced technology development fabs. • Photomask and Reticle Expertise: In-depth knowledge of mask fabrication, mask metrology, aerial image modeling, pellicle technology, reticle degradation mechanisms, and mask defect inspection platforms. • Lithography Toolset and Process Knowledge: Proven proficiency across DUV (ArFi / 193nm immersion) and EUV exposure systems (ASML Twinscan / NXE platforms), track integration, and advanced CD metrology. • Analytical and Statistical Mastery: Advanced proficiency with Statistical Process Control (SPC), Design of Experiments (DOE), yield analytics platforms, JMP, Python, or MATLAB for complex data modeling and multivariate analysis. • Leadership and Communication: Track record of driving cross-functional taskforces, writing comprehensive technical documentation, and delivering executive briefings on process yield, tool performance, and quality enhancements.
- We invite you to bring your technical expertise and innovative vision to Intel Foundry, where your work will drive the next generation of semiconductor technology.
- Join us to make an impact and advance your career in a dynamic, collaborative environment.
Benefits
- Your recruiting team will share the confirmed base salary along with any applicable total compensation elements upon employment offer delivery.
Sourced directly from Intel’s career page
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Specialisation
Open roles at Intel
607 positions
Job ID
/job/Ireland-Leixlip/Senior-Lithography-and-Photomask-Process-Engineer_JR0287375
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